A proposed nanofabrication technique using optical masks for metastable atom lithography
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| 42613_1.pdf | 683Kb | Adobe PDF | View |
| Title | A proposed nanofabrication technique using optical masks for metastable atom lithography |
|---|---|
| Author | Baker, Mark Adam; Palmer, Adam James; Sang, Robert |
| Publication Title | Proceedings of the 2004 Conference on Optoelectronic and Microelectronic Materials and Devices |
| Conference name | 2004 Conference on Optoelectronic and Microelectronic Materials and Devices |
| Year Published | 2005 |
| Publisher | IEEE |
| Peer Reviewed | Yes |
| Published | Yes |
| Alternative URI | http://dx.doi.org/10.1109/COMMAD.2004.1577560 |
| Copyright Statement | Copyright 2005 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. |
| Research Centre | Centre for Quantum Dynamics |
| Faculty | Faculty of Science, Environment, Engineering and Technology |
| Publication Type | Conference Publications (Full Written Paper - Refereed) |
Please use this identifier to cite this record: http://hdl.handle.net/10072/22876
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