A proposed nanofabrication technique using optical masks for metastable atom lithography

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Title A proposed nanofabrication technique using optical masks for metastable atom lithography
Author Baker, Mark Adam; Palmer, Adam James; Sang, Robert
Publication Title Proceedings of the 2004 Conference on Optoelectronic and Microelectronic Materials and Devices
Year Published 2005
Place of publication USA
Publisher IEEE
Abstract We present an overview of our progress towards using optical fields as 'light masks' for metastable atomic beam lithography. Numerical simulations have been undertaken to model the interaction of a beam of metastable neon atoms with a standing wave of 640.2 nm laser light. The current experimental setup and the proposed scheme for focusing the atoms is detailed
Peer Reviewed Yes
Published Yes
Alternative URI http://dx.doi.org/10.1109/COMMAD.2004.1577560
Copyright Statement Copyright 2005 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.
Conference name 2004 Conference on Optoelectronic and Microelectronic Materials and Devices
Location Brisbane
Date From 2004-12-08
Date To 2004-12-10
Date Accessioned 2007-05-11
Date Available 2010-10-13T10:02:57Z
Language en_AU
Research Centre Centre for Quantum Dynamics
Faculty Faculty of Science, Environment, Engineering and Technology
Subject PRE2009-Atomic and Molecular Physics
Publication Type Conference Publications (Full Written Paper - Refereed)
Publication Type Code e1a

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