Comparison of alkanethiol resist layers for use in atom lithography

There are no files associated with this record.

Title Comparison of alkanethiol resist layers for use in atom lithography
Author Beardmore, Josh; Palmer, Adam James; Fabrie, Croine G.C.H.M.; Sang, Robert
Publication Title Proceedings of the Australasian Conference on Optics, Lasers, and Spectroscopy and Australian Conference on Optical Fibre Technology in association with the International Workshop on Dissipative Solitons 2009
Editor Peter Veitch
Year Published 2009
Peer Reviewed Yes
Published Yes
Publisher URI http://aos.physics.mq.edu.au/acols/ACOLShome.htm
Conference name ACOLS ACOFT 09:Australasian Conference on Optics, Lasers, and Spectroscopy
Location Adelaide, Australia
Date From 2009-11-29
Date To 2009-12-03
URI http://hdl.handle.net/10072/31911
Date Accessioned 2010-05-28
Language en_AU
Research Centre Centre for Quantum Dynamics
Faculty Faculty of Science, Environment, Engineering and Technology
Subject PRE2009-Atomic and Molecular Physics
Publication Type Conference Publications (Full Written Paper - Refereed)
Publication Type Code e1

Show simple item record

Griffith University copyright notice