Comparison of alkanethiol resist layers for use in atom lithography
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| Title | Comparison of alkanethiol resist layers for use in atom lithography |
|---|---|
| Author | Beardmore, Josh; Palmer, Adam James; Fabrie, Croine G.C.H.M.; Sang, Robert |
| Publication Title | Proceedings of the Australasian Conference on Optics, Lasers, and Spectroscopy and Australian Conference on Optical Fibre Technology in association with the International Workshop on Dissipative Solitons 2009 |
| Editor | Peter Veitch |
| Year Published | 2009 |
| Peer Reviewed | Yes |
| Published | Yes |
| Publisher URI | http://aos.physics.mq.edu.au/acols/ACOLShome.htm |
| Conference name | ACOLS ACOFT 09:Australasian Conference on Optics, Lasers, and Spectroscopy |
| Location | Adelaide, Australia |
| Date From | 2009-11-29 |
| Date To | 2009-12-03 |
| URI | http://hdl.handle.net/10072/31911 |
| Date Accessioned | 2010-05-28 |
| Date Available | 2010-10-07T04:08:21Z |
| Language | en_AU |
| Research Centre | Centre for Quantum Dynamics |
| Faculty | Faculty of Science, Environment, Engineering and Technology |
| Subject | PRE2009-Atomic and Molecular Physics |
| Publication Type | Conference Publications (Full Written Paper - Refereed) |
| Publication Type Code | e1 |
Please use this identifier to cite this record: http://hdl.handle.net/10072/31911
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