Consequences of NO thermal treatments in the properties of dielectric films / SiC structures
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| Title | Consequences of NO thermal treatments in the properties of dielectric films / SiC structures |
|---|---|
| Author | Stedile, F. C.; Corrêa, S. A.; Radtke, C.; Miotti, L.; Baumvol, I. J. R.; Soares, G.V.; Kong, Frederick Chung Jeng; Han, Jisheng; Hold, Leonie Katharina; Dimitrijev, Sima |
| Year Published | 2010 |
| Publisher | Trans Tech Publications Ltd |
| Citation | Materials Science Forum, Vol. 645-648, pp. 689-692 |
| Peer Reviewed | Yes |
| Published | Yes |
| Alternative URI | http://dx.doi.org/10.4028/www.scientific.net/MSF.645-648.689 |
| Copyright Statement | Self-archiving of the author-manuscript version is not yet supported by this journal. Please refer to the journal link for access to the definitive, published version or contact the author[s] for more information. |
| Research Centre | Queensland Micro and Nanotechnology Centre |
| Faculty | Faculty of Science, Environment, Engineering and Technology |
| Publication Type | Journal Articles (Refereed Article) |
Please use this identifier to cite this record: http://hdl.handle.net/10072/37701
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