Consequences of NO thermal treatments in the properties of dielectric films / SiC structures

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Title Consequences of NO thermal treatments in the properties of dielectric films / SiC structures
Author Stedile, F. C.; Corrêa, S. A.; Radtke, C.; Miotti, L.; Baumvol, I. J. R.; Soares, G.V.; Kong, Frederick Chung Jeng; Han, Jisheng; Hold, Leonie Katharina; Dimitrijev, Sima
Year Published 2010
Publisher Trans Tech Publications Ltd
Citation Materials Science Forum, Vol. 645-648, pp. 689-692
Peer Reviewed Yes
Published Yes
Alternative URI http://dx.doi.org/10.4028/www.scientific.net/MSF.645-648.689
Copyright Statement Self-archiving of the author-manuscript version is not yet supported by this journal. Please refer to the journal link for access to the definitive, published version or contact the author[s] for more information.
Research Centre Queensland Micro and Nanotechnology Centre
Faculty Faculty of Science, Environment, Engineering and Technology
Publication Type Journal Articles (Refereed Article)

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