Structure Formation in atom lithography using geometric collimation

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Title Structure Formation in atom lithography using geometric collimation
Author Meijer, T.; Beardmore, Josh; Fabrie, C.G.C.H.M.; Lieshout, J.P. van; Notermans, R.P.M.J.W.; Sang, Robert; Vredenbregt, E.J.D.; Leeuwen, K.A.H. van
Journal Name Applied Physics B: lasers and optics
Year Published 2011
Place of publication Germany
Publisher Springer
Abstract Atom lithography uses standing wave light fields as arrays of lenses to focus neutral atom beams into line patterns on a substrate. Laser cooled atom beams are commonly used, but an atom beam source with a small opening placed at a large distance from a substrate creates atom beams which are locally geometrically collimated on the substrate. These beams have local offset angles with respect to the substrate. We show that this affects the height, width, shape, and position of the created structures. We find that simulated effects are partially obscured in experiments by substrate-dependent diffusion of atoms, while scattering and interference just above the substrate limit the quality of the standing wave lens. We find that in atom lithography with- out laser cooling the atom beam source geometry is imaged onto the substrate by the standing wave lens. We therefore propose using structured atom beam sources to image more complex patterns on subwavelength scales in a massively parallel way.
Peer Reviewed Yes
Published Yes
Alternative URI
Volume 105
Issue Number 4
Page from 703
Page to 713
ISSN 0946-2171
Date Accessioned 2011-11-25; 2012-02-13T05:05:22Z
Research Centre Centre for Quantum Dynamics
Faculty Faculty of Science, Environment, Engineering and Technology
Subject Atomic and Molecular Physics
Publication Type Journal Articles (Refereed Article)
Publication Type Code c1

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