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dc.contributor.authorMeijer, T
dc.contributor.authorBeardmore, JP
dc.contributor.authorFabrie, CGCHM
dc.contributor.authorvan Lieshout, JP
dc.contributor.authorNotermans, RPMJW
dc.contributor.authorSang, RT
dc.contributor.authorVredenbregt, EJD
dc.contributor.authorvan Leeuwen, KAH
dc.date.accessioned2017-07-10T03:37:26Z
dc.date.available2017-07-10T03:37:26Z
dc.date.issued2011
dc.date.modified2012-02-13T05:05:22Z
dc.identifier.issn0946-2171
dc.identifier.doi10.1007/s00340-011-4743-5
dc.identifier.urihttp://hdl.handle.net/10072/42465
dc.description.abstractAtom lithography uses standing wave light fields as arrays of lenses to focus neutral atom beams into line patterns on a substrate. Laser cooled atom beams are commonly used, but an atom beam source with a small opening placed at a large distance from a substrate creates atom beams which are locally geometrically collimated on the substrate. These beams have local offset angles with respect to the substrate. We show that this affects the height, width, shape, and position of the created structures. We find that simulated effects are partially obscured in experiments by substrate-dependent diffusion of atoms, while scattering and interference just above the substrate limit the quality of the standing wave lens. We find that in atom lithography with- out laser cooling the atom beam source geometry is imaged onto the substrate by the standing wave lens. We therefore propose using structured atom beam sources to image more complex patterns on subwavelength scales in a massively parallel way.
dc.description.peerreviewedYes
dc.description.publicationstatusYes
dc.languageEnglish
dc.language.isoeng
dc.publisherSpringer
dc.publisher.placeGermany
dc.relation.ispartofstudentpublicationY
dc.relation.ispartofpagefrom703
dc.relation.ispartofpageto713
dc.relation.ispartofissue4
dc.relation.ispartofjournalApplied Physics B: lasers and optics
dc.relation.ispartofvolume105
dc.rights.retentionY
dc.subject.fieldofresearchAtomic and molecular physics
dc.subject.fieldofresearchAtomic, molecular and optical physics
dc.subject.fieldofresearchMechanical engineering
dc.subject.fieldofresearchcode510201
dc.subject.fieldofresearchcode5102
dc.subject.fieldofresearchcode4017
dc.titleStructure Formation in atom lithography using geometric collimation
dc.typeJournal article
dc.type.descriptionC1 - Articles
dc.type.codeC - Journal Articles
dcterms.licensehttp://creativecommons.org/licenses/by/4.0/
dc.description.versionVersion of Record (VoR)
gro.rights.copyright© The Author(s) 2011. This article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.
gro.date.issued2011
gro.hasfulltextFull Text
gro.griffith.authorSang, Robert T.


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