X-Ray Photoelectron Spectroscopy Study of Oxide Removal Using Atomic Hydrogen for Large-Area II–VI Material Growth
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| Title | X-Ray Photoelectron Spectroscopy Study of Oxide Removal Using Atomic Hydrogen for Large-Area II–VI Material Growth |
|---|---|
| Author | Myers, Thomas H.; Dinan, John H.; Doyle, Kevin; Lee, Kyoung-Keun; Chai, Jessica |
| Year Published | 2012 |
| Publisher | Springer |
| Citation | Journal of Electronic Materials, Vol. 41(10), pp. 2799-2809 |
| Peer Reviewed | Yes |
| Published | Yes |
| Alternative URI | http://dx.doi.org/10.1007/s11664-012-2085-7 |
| Research Centre | Queensland Micro and Nanotechnology Centre |
| Faculty | Faculty of Science, Environment, Engineering and Technology |
| Publication Type | Journal Articles (Refereed Article) |
Please use this identifier to cite this record: http://hdl.handle.net/10072/48304
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