X-Ray Photoelectron Spectroscopy Study of Oxide Removal Using Atomic Hydrogen for Large-Area II–VI Material Growth

There are no files associated with this record.

Title X-Ray Photoelectron Spectroscopy Study of Oxide Removal Using Atomic Hydrogen for Large-Area II–VI Material Growth
Author Lee, Kyoung-Keun; Doyle, Kevin; Chai, Jessica; Dinan, John H.; Myers, Thomas H.
Year Published 2012
Publisher Springer
Citation Journal of Electronic Materials, Vol. 41(10), pp. 2799-2809
Peer Reviewed Yes
Published Yes
Alternative URI http://dx.doi.org/10.1007/s11664-012-2085-7
Research Centre Queensland Micro and Nanotechnology Centre
Faculty Faculty of Science, Environment, Engineering and Technology
Publication Type Journal Articles (Refereed Article)

Show full item record

Griffith University copyright notice