Lithographic pattern formation via metastable state rare gas atomic beams

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Title Lithographic pattern formation via metastable state rare gas atomic beams
Author Baker, Mark Adam; Palmer, Adam James; MacGillivray, William Robinson; Sang, Robert
Journal Name Nanotechnology
Year Published 2004
Place of publication London
Publisher Institute of Physics Publishing
Abstract Atomic beams of argon and neon in excited electronic metastable states have been used to pattern bare and dodecanethiol (DDT) resist coated Au/Si substrates. Positive and negative contrast patterning has been observed for DDT-Au/Si, and negative patterning has been observed for bare Au/Si. Our results provide evidence for the formation of these negative patterns resulting from significant background pump oil contamination, and at significantly lower metastable dosages than previously observed. X-ray photoelectron spectroscopy (XPS) results indicate the growth of a carbonaceous layer as the origin of the negative resists in DDT-Au/Si and bare Au/Si substrates. For DDT-Au/Si, results indicate that the transition from positive to negative resist formation relies both on the metastable dosages and level of background pump oil contamination.
Peer Reviewed Yes
Published Yes
Publisher URI
Alternative URI
Volume 15
Page from 1356
Page to 1362
ISSN 0957-4484
Date Accessioned 2004-08-30
Language en_AU
Research Centre Centre for Quantum Dynamics
Faculty Faculty of Science
Subject PRE2009-Atomic and Molecular Physics
Publication Type Journal Articles (Refereed Article)
Publication Type Code c1

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