O2 plasma treated polyimide-based humidity sensors

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Title O2 plasma treated polyimide-based humidity sensors
Author Suzuki, Takeharu; Tanner, Philip; Thiel, David Victor
Journal Name The Analyst
Year Published 2002
Place of publication United Kingdon
Publisher Royal Society of Chemistry
Abstract The effect of non-plasma and plasma treated polyimide-based humidity sensors is presented. Pure oxygen was used to etch polyimide in a plasma etcher. The sensor treated in a plasma exhibited higher sensitivity and faster response speed against moisture. The plasma treated sensor had 3.4 times the sensitivity and responded almost twice as fast as the non-plasma treated sensor. A further comparison of sensor outputs, sensitivity and response speed are presented. Chemical analysis of the polyimide surface was carried out by X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy (ATR-FTIR). XPS and ATR-FTIR showed the increase in carbonyl carbon bonds, CO, after the plasma treatment. Geometrical modification was observed by atomic force microscopy (AFM). It showed considerable surface roughness after the plasma treatment. O2 plasma treatment improved the sensitivity, and reduced the hysteresis of the sensor due to the increase in CO bonds in the polyimide.
Peer Reviewed Yes
Published Yes
Publisher URI http://www.rsc.org/publishing/journals/AN/Index.asp
Alternative URI http://dx.doi.org/10.1039/B205085D
Copyright Statement Copyright 2002 Royal Society of Chemistry. Please refer to the journal link for access to the definitive, published version.
Volume 127
Page from 1342
Page to 1346
ISSN 0003-2654
Date Accessioned 2003-02-28
Date Available 2011-04-28T07:07:28Z
Language en_AU
Research Centre Queensland Micro and Nanotechnology Centre
Faculty Faculty of Engineering and Information Technology
Subject PRE2009-Integrated Circuits; PRE2009-Other Electronic Engineering
URI http://hdl.handle.net/10072/6672
Publication Type Journal Articles (Refereed Article)
Publication Type Code c1

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