Contamination resists in metastable atom lithography

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Title Contamination resists in metastable atom lithography
Author Baker, Mark Adam; Palmer, Adam James; Sang, Robert
Publication Title COMMAD 2002 PROCEEDINGS
Editor Michael Gal
Year Published 2002
Publisher Institute of Electrical and Electronic Engineers, Inc.
Peer Reviewed No
Published Yes
Publisher URI http://www.ieee.org/portal/site
Alternative URI http://ieeexplore.ieee.org/xpl/tocresult.jsp?isnumber=27730&isYear=2002
Copyright Statement Copyright 2002 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.
Publication Type Conference Publications (Full Written Paper - Non-Refereed)

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