Contamination resists in metastable atom lithography
| File | Size | Format | |
|---|---|---|---|
| 25336_1.pdf | 296Kb | Adobe PDF | View |
| Title | Contamination resists in metastable atom lithography |
|---|---|
| Author | Baker, Mark Adam; Palmer, Adam James; Sang, Robert |
| Publication Title | COMMAD 2002 PROCEEDINGS |
| Editor | Michael Gal |
| Year Published | 2002 |
| Publisher | Institute of Electrical and Electronic Engineers, Inc. |
| Peer Reviewed | No |
| Published | Yes |
| Publisher URI | http://www.ieee.org/portal/site |
| Alternative URI | http://ieeexplore.ieee.org/xpl/tocresult.jsp?isnumber=27730&isYear=2002 |
| Copyright Statement | Copyright 2002 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. |
| Publication Type | Conference Publications (Full Written Paper - Non-Refereed) |
Please use this identifier to cite this record: http://hdl.handle.net/10072/8867
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