Statistics for "Comparison of alkanethiol resist layers for use in atom lithography"

Title:

Comparison of alkanethiol resist layers for use in atom lithography

Author(s):

Beardmore, Josh;Palmer, Adam James;Fabrie, Croine G.C.H.M.;Sang, Robert

Date Last Updated:

Friday, May 28, 2010

Statistics are for the period between Thursday, February 1, 2007 and Wednesday, April 1, 2015

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Overall Statistics

Brief Views Full Views Downloads Click Throughs
192 0 0 54

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Geographic Statistics

Country Brief Views Full Views Downloads Click Throughs
United States 78 0 0 12
Australia 69 0 0 18
China 23 0 0 3
France 15 0 0 16
Germany 3 0 0 0
Netherlands 3 0 0 3
Oman 1 0 0 0
Denmark 0 0 0 1

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Monthly statistics for the last twelve months

Month Brief Views Full Views Downloads Click Throughs
Apr 2015 0 0 0 0
Mar 2015 4 0 0 1
Feb 2015 7 0 0 3
Jan 2015 14 0 0 7
Dec 2014 11 0 0 5
Nov 2014 9 0 0 3
Oct 2014 9 0 0 3
Sep 2014 8 0 0 4
Aug 2014 4 0 0 1
Jul 2014 6 0 0 1
Jun 2014 0 0 0 2
May 2014 5 0 0 1
Apr 2014 8 0 0 1
Total 85 0 0 32

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  • Brief View: Default publication record
  • Full View: Expanded publication details
  • Download: Attached file which has been opened
  • Click Through: Link to publisher's website which has been clicked