Statistics for "Comparison of alkanethiol resist layers for use in atom lithography"

Title:

Comparison of alkanethiol resist layers for use in atom lithography

Author(s):

Beardmore, Josh;Palmer, Adam James;Fabrie, Croine G.C.H.M.;Sang, Robert

Date Last Updated:

Friday, May 28, 2010

Statistics are for the period between Thursday, February 1, 2007 and Saturday, September 5, 2015

Set a new date range

Start Date
End Date

Overall Statistics

Brief Views Full Views Downloads Click Throughs
220 0 0 61

Set IP address range

Geographic Statistics

Country Brief Views Full Views Downloads Click Throughs
United States 91 0 0 12
Australia 73 0 0 19
China 27 0 0 3
France 20 0 0 22
Germany 4 0 0 0
Netherlands 3 0 0 3
Oman 1 0 0 0
Russian Federation 1 0 0 0
Denmark 0 0 0 1

Reorder geographical statistics

Limit results to top countries

Monthly statistics for the last twelve months

Month Brief Views Full Views Downloads Click Throughs
Sep 2015 0 0 0 0
Aug 2015 1 0 0 1
Jul 2015 5 0 0 2
Jun 2015 4 0 0 2
May 2015 12 0 0 1
Apr 2015 10 0 0 1
Mar 2015 4 0 0 1
Feb 2015 7 0 0 3
Jan 2015 14 0 0 7
Dec 2014 11 0 0 5
Nov 2014 9 0 0 3
Oct 2014 9 0 0 3
Sep 2014 8 0 0 4
Total 94 0 0 33

Definition of Terms

  • Brief View: Default publication record
  • Full View: Expanded publication details
  • Download: Attached file which has been opened
  • Click Through: Link to publisher's website which has been clicked