Statistics for "Comparison of alkanethiol resist layers for use in atom lithography"

Title:

Comparison of alkanethiol resist layers for use in atom lithography

Author(s):

Beardmore, Josh;Palmer, Adam James;Fabrie, Croine G.C.H.M.;Sang, Robert

Date Last Updated:

Friday, May 28, 2010

Statistics are for the period between Thursday, February 1, 2007 and Wednesday, September 28, 2016

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Overall Statistics

Brief Views Full Views Downloads Click Throughs
315 0 0 90

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Geographic Statistics

Country Brief Views Full Views Downloads Click Throughs
United States 119 0 0 16
Australia 77 0 0 22
China 40 0 0 3
France 33 0 0 31
Unknown 24 0 0 8
Italy 8 0 0 3
United Kingdom 5 0 0 3
Germany 4 0 0 0
Netherlands 3 0 0 3
Russian Federation 2 0 0 0
Oman 1 0 0 0
Denmark 0 0 0 1

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Monthly statistics for the last twelve months

Month Brief Views Full Views Downloads Click Throughs
Sep 2016 9 0 0 2
Aug 2016 9 0 0 2
Jul 2016 11 0 0 3
Jun 2016 15 0 0 5
May 2016 9 0 0 4
Apr 2016 2 0 0 2
Mar 2016 5 0 0 4
Feb 2016 10 0 0 1
Jan 2016 9 0 0 4
Dec 2015 15 0 0 2
Nov 2015 14 0 0 3
Oct 2015 6 0 0 0
Sep 2015 5 0 0 1
Total 119 0 0 33

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  • Brief View: Default publication record
  • Full View: Expanded publication details
  • Download: Attached file which has been opened
  • Click Through: Link to publisher's website which has been clicked