Statistics for "Comparison of alkanethiol resist layers for use in atom lithography"

Title:

Comparison of alkanethiol resist layers for use in atom lithography

Author(s):

Beardmore, Josh;Palmer, Adam James;Fabrie, Croine G.C.H.M.;Sang, Robert

Date Last Updated:

Friday, May 28, 2010

Statistics are for the period between Thursday, February 1, 2007 and Saturday, November 1, 2014

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Overall Statistics

Brief Views Full Views Downloads Click Throughs
152 0 0 36

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Geographic Statistics

Country Brief Views Full Views Downloads Click Throughs
Australia 65 0 0 16
United States 61 0 0 10
China 19 0 0 3
Germany 3 0 0 0
Netherlands 3 0 0 3
Oman 1 0 0 0
Denmark 0 0 0 1
France 0 0 0 2

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Monthly statistics for the last twelve months

Month Brief Views Full Views Downloads Click Throughs
Nov 2014 0 0 0 0
Oct 2014 9 0 0 3
Sep 2014 8 0 0 4
Aug 2014 4 0 0 1
Jul 2014 6 0 0 1
Jun 2014 0 0 0 2
May 2014 5 0 0 1
Apr 2014 8 0 0 1
Mar 2014 7 0 0 0
Feb 2014 6 0 0 0
Jan 2014 3 0 0 3
Dec 2013 4 0 0 1
Nov 2013 6 0 0 0
Total 66 0 0 17

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  • Brief View: Default publication record
  • Full View: Expanded publication details
  • Download: Attached file which has been opened
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